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Characterization of monotonic static CMOS gates in a 65nm technology

Published:17 April 2005Publication History

ABSTRACT

This paper reviews the use of skewed monotonic static CMOS logic gates in scaled technologies where gate leakage currents become significant. High-level tradeoffs and synthesis approaches are discussed, and some experiments are constructed to evaluate the gate-level performance tradeoffs in a hypothetical standard 65nm CMOS technology. At the gate level, significant improvements in static power consumption are possible without reduction in evaluation delays, but the tradeoffs vary as the conditions and the amount of skewing are changed. NAND forms are still preferred as the gate leakage grows.

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  1. Characterization of monotonic static CMOS gates in a 65nm technology

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    • Published in

      cover image ACM Conferences
      GLSVLSI '05: Proceedings of the 15th ACM Great Lakes symposium on VLSI
      April 2005
      518 pages
      ISBN:1595930574
      DOI:10.1145/1057661
      • General Chair:
      • John Lach,
      • Program Chairs:
      • Gang Qu,
      • Yehea Ismail

      Copyright © 2005 ACM

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      Association for Computing Machinery

      New York, NY, United States

      Publication History

      • Published: 17 April 2005

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      Overall Acceptance Rate312of1,156submissions,27%

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