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Leakage current starved domino logic
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Source Great Lakes Symposium on VLSI archive
Proceedings of the 16th ACM Great Lakes symposium on VLSI table of contents
Philadelphia, PA, USA
SESSION: Power aware digital circuits table of contents
Pages: 428 - 433  
Year of Publication: 2006
ISBN:1-59593-347-6
Authors
Zhiyu Liu  University of Wisconsin - Madison, Madison, Wisconsin
Volkan Kursun  University of Wisconsin - Madison, Madison, Wisconsin
Sponsors
ACM: Association for Computing Machinery
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
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ABSTRACT

A new circuit technique based on a single PMOS sleep transistor and a dual threshold voltage CMOS technology is proposed in this paper for simultaneously reducing subthreshold and gate oxide leakage currents in idle domino logic circuits. In the sleep mode, the output inverter and keeper transistor of a domino gate are disconnected from the power supply by turning off a high threshold voltage sleep switch. The dynamic and output nodes are discharged by the initially high subthreshold and gate oxide leakage currents produced by the NMOS transistors in the pull-down network, output inverter, and fan-out gates. After the node voltages settle, the circuit is placed into a low subthreshold and gate oxide leakage state. The effectiveness of the circuit technique for suppressing leakage current is verified under significant fluctuations of channel length, gate oxide thickness, and channel doping concentration due to process variations. The proposed circuit technique lowers the total leakage power by 67.7% to 98.8% as compared to standard dual threshold voltage domino logic circuits. Similarly, an 11.7% to 84.1% reduction in total leakage power is observed as compared to a previously published sleep switch scheme in a 45nm CMOS technology.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
S. Shigematsu, S. Mutoh, Y. Matsuya, and J. Yamada, "A 1V High-speed MTCMOS Circuit Scheme for Power-down Applications," Proceedings of the IEEE International Symposium on VLSI Circuits, pp. 125--126, June 1995.
 
2
J. T. Kao and A. P. Chandrakasan, "Dual-threshold Voltage Techniques for Low-Power Digital Circuits," IEEE Journal of Solid-State Circuits, Vol. 35, No. 7, pp. 1009--1018, July 2000.
 
3
J. Kao, "Dual Threshold Voltage Domino Logic," Proceedings of the European Solid-State Circuits Conference, pp. 118--121, September 1999.
4
 
5
S. Heo and K. Asanovic, "Leakage-Biased Dynamic Fine-Grain Leakage Reduction," Proceedings of the IEEE International Symposium on VLSI Circuits, pp. 316--319, June 2002.
 
6
 
7
H. Sasaki, M. Ono, T. Yoshitomi, T. Ohguro, S. Nakamura, M. Saito, and H. Iwai, "1.5 nm Direct-Tunneling Gate Oxide Si MOSFETs," IEEE Transactions on Electron Devices, Vol. 43, No. 8, pp. 1233--1242, August 1996.
 
8
Berkeley Predictive Technology Model (BPTM), http://www.device.eecs .berkeley.edu/~ptm/download.html.
 
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Z. Liu and V. Kursun, "Domino Logic Circuit Techniques for Suppressing Subthreshold and Gate Oxide Leakage," United States Patent Pending.
 
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Z. Liu and V. Kursun, "Shifted Leakage Power Characteristics of Dynamic Circuits Due to Gate Oxide Tunneling," Proceedings of the IEEE International Systems on Chip (SOC) Conference, pp. 151--154, September 2005.
 
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K. Schuegraf and C. Hu, "Hole injection SiO2 breakdown model for very low voltage lifetime extrapolation," IEEE Transactions on Electron Devices, Vol. 41, pp. 761--767, May 1994.

Collaborative Colleagues:
Zhiyu Liu: colleagues
Volkan Kursun: colleagues