skip to main content
10.1145/1231996.1232003acmconferencesArticle/Chapter ViewAbstractPublication PagesispdConference Proceedingsconference-collections
Article

Is your layout density verification exact?: a fast exact algorithm for density calculation

Published: 18 March 2007 Publication History

Abstract

As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask layout uniformity/evenness is highly desired, and it is usually measured by the feature density with defined feasible range in manufacture process design rules. To address the density control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/hours to a few minutes/seconds. And it is even faster than the existing approximate algorithms in literature.

References

[1]
B. Biswas, Modeling in-die process variation with accuracy, http://www.eetimes.com/story/OEG20040115S0027.
[2]
L. Deng, K. Chao, H. Xiang, and D.F.Wong, Coupling-aware dummy metal insertion for lithography, Proc. Asia and South Pacific Design Automation Conf., Jan. 2006.
[3]
A. B. Kahng, G. Robins, A. Singh, H. Wang and A. Zelikovsky, Filling and Slotting: Analysis and Algorithm, Proc. ACM/IEEE Intl. Symp. on Physical Design, pp. 95--102, April 1998.
[4]
A. B. Kahng, G. Robins, A. Singh and A. Zelikovsky, New Multilevel and Hierarchical Algorithms for Layout Density Control, Proc. Asia and South Pacific Design Automation Conf., pp. 221--224, Jan. 1999.
[5]
A. B. Kahng, G. Robins, A. Singh and A. Zelikovsky, New and Exact Filling Algorithms for Layout Density Control, Proc. IEEE Intl. Conf. on VLSI Design, pp. 106--110, Jan. 1999.
[6]
A. B. Kahng, G. Robins, A. Singh and A. Zelikovsky, Filling Algorithms and Analyses for Layout Density Control, IEEE Transactions on Computer-Aided Design 18(4), pp. 445--462, 1999.
[7]
Y. Chen, A. B. Kahng, G. Robins, and A. Zelikovsky, Monte-Carlo Algorithms for Layout Density Control, Proc. Asia and South Pacific Design Automation Conf., pp. 523--528, Jan. 2000.
[8]
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, Practical Iterated Fill Synthesis for CMP Uniformity, Proc. ACM/IEEE Design Automation Conf., pp. 671--674, June 2000.
[9]
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, Hierarchical Dummy Fill for Process Uniformity, Proc. Asia and South Pacific Design Automation Conf., pp. 139--144, Jan. 2001.
[10]
Y. Chen, A. B. Kahng, G. Robins and A. Zelikovsky, Closing the Smoothness and Uniformity Gap in Area Fill Synthesis, Proc. ACM/IEEE Intl. Symp. on Physical Design, pp. 137--142, April 2002.
[11]
Y. Chen, A. B. Kahng, G. Robins, and A. Zelikovsky, Area Fill Synthesis for Uniform Layout Density, IEEE Trans. on CAD, vol 21, No. 10, pp 1132--1147, Oct. 2002.
[12]
Y. Chen, P. Gupta, and A. B. Kahng, Performance-Impact Limited Dummy Fill Insertion, Proc. SPIE Conf. on Design and Process Integration for Microelectronic Manufacturing, pp. 75--86, Feb. 2003.
[13]
Y. Chen, A. B. Kahng, G. Robins, A. Zelikovsky, and Y. H. Zheng, Data Volume Reduction in Dummy Fill Generation, Proc. Design Automation and Testing in Europe, pp. 868--873, March 2003.
[14]
Y. Chen, A. B. Kahng, G. Robins, A. Zelikovsky, and Y. Zheng, Area Fill Generation With Inherent Data Volume Reduction, Proc. Design Automation and Testing in Europe, Munich, Germany, pp. 868--873, March 2003.
[15]
P. Gupta, A. B. Kahng, Y. Kim, D. Sylvester, Self-Compensating Design for Focus Variation, Proc. Design Automation Conf., pp. 365--368, June, 2005.
[16]
A. B. Kahng, IC Layout and Manufacturability: Critical Links and Design Flow Implications, IEEE Intl. Conf. on VLSI Design, pp. 100--105, Jan. 1999.
[17]
R. Tian, D. F. Wong, R. Boone, Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability, Proc. Design Automation Conf, pp 667--670, 2000.
[18]
R. Tian, X. Tang, D. F. Wong, Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process, Proc. International Symposium on Physical Design, pp 118--123, 2001.
[19]
K. Veelenturf, The road to better reliability and yield embedded DFM tools, Proc. of the conference on design, automation and test in Europe, pp.67--69, 2000.
[20]
X. Wang, C. C. Chiang, J. Kawa and Q. Su, A Min-Variance Iterative Method for Fast Smart Dummy Feature Density Assignment in Chemical-Mechanical Polishing, Proc. International Symposium on Quality Electronic Design, pp. 258--263, 2005.

Cited By

View all
  • (2012)Parasitic Extraction with Metal Fill Effects Consideration in IC Design Flow to Improve Design CycleAdvanced Materials Research10.4028/www.scientific.net/AMR.462.98462(98-102)Online publication date: Feb-2012
  • (2009)A simple fast exact density calculation algorithm2009 IEEE International Conference on IC Design and Technology10.1109/ICICDT.2009.5166268(71-74)Online publication date: May-2009

Recommendations

Comments

Information & Contributors

Information

Published In

cover image ACM Conferences
ISPD '07: Proceedings of the 2007 international symposium on Physical design
March 2007
206 pages
ISBN:9781595936134
DOI:10.1145/1231996
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

Sponsors

Publisher

Association for Computing Machinery

New York, NY, United States

Publication History

Published: 18 March 2007

Permissions

Request permissions for this article.

Check for updates

Author Tags

  1. DFM
  2. density
  3. fix-dissection

Qualifiers

  • Article

Conference

ISPD07
Sponsor:
ISPD07: International Symposium on Physical Design
March 18 - 21, 2007
Texas, Austin, USA

Acceptance Rates

Overall Acceptance Rate 62 of 172 submissions, 36%

Upcoming Conference

ISPD '25
International Symposium on Physical Design
March 16 - 19, 2025
Austin , TX , USA

Contributors

Other Metrics

Bibliometrics & Citations

Bibliometrics

Article Metrics

  • Downloads (Last 12 months)4
  • Downloads (Last 6 weeks)0
Reflects downloads up to 09 Feb 2025

Other Metrics

Citations

Cited By

View all
  • (2012)Parasitic Extraction with Metal Fill Effects Consideration in IC Design Flow to Improve Design CycleAdvanced Materials Research10.4028/www.scientific.net/AMR.462.98462(98-102)Online publication date: Feb-2012
  • (2009)A simple fast exact density calculation algorithm2009 IEEE International Conference on IC Design and Technology10.1109/ICICDT.2009.5166268(71-74)Online publication date: May-2009

View Options

Login options

View options

PDF

View or Download as a PDF file.

PDF

eReader

View online with eReader.

eReader

Figures

Tables

Media

Share

Share

Share this Publication link

Share on social media