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Incremental wavelet importance sampling for direct illumination

Published:05 November 2007Publication History

ABSTRACT

Most of existing importance sampling methods for direct illumination exploit importance of illumination and surface BRDF. Without taking the visibility into consideration, they can not adaptively adjust the number of samples for each pixel during the sampling process. As a result, these methods tend to produce images with noise in partially occluded regions. In this paper, we introduce an incremental wavelet importance sampling approach, in which the visibility information is used to determine the number of samples at run time. For this purpose, we present a perceptual-based variance that is computed from visibility of samples. In the sampling process, the Halton sample points are incrementally warped for each pixel until the variance of warped samples converges. We demonstrate that our method is more efficient than existing importance sampling approaches.

References

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  1. Incremental wavelet importance sampling for direct illumination

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    • Published in

      cover image ACM Conferences
      VRST '07: Proceedings of the 2007 ACM symposium on Virtual reality software and technology
      November 2007
      259 pages
      ISBN:9781595938633
      DOI:10.1145/1315184

      Copyright © 2007 ACM

      Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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      New York, NY, United States

      Publication History

      • Published: 5 November 2007

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