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ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction

Published: 08 June 2008 Publication History

Abstract

In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction manner. We first propose a compact post-OPC litho-metric for a detailed router based on statistical characterization. We characterize the interferences among weak grids filled with one of predefined litho-prone shapes (e.g., jog-corner, via, line-end). Our litho-metric derived from the characterization shows high fidelity to total edge placement error (EPE) in large scale, compared with Calibre-OPC/ORC. As a chip itself is in the largest scale, ELIAD powered by the proposed metric can enhance the overall post-OPC printed silicon image. Experimental results on 65nm industrial circuits show that ELIAD outperforms a ripup/rerouting approach such as RADAR [17] with 8x more EPE hotspot reduction and 12x speedup. Also, compared with a conventional detailed router, ELIAD is only about 50% slower.

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  • (2014)Design-for-debug routing for FIB probingProceedings of the conference on Design, Automation & Test in Europe10.5555/2616606.2617065(1-4)Online publication date: 24-Mar-2014
  • (2014)Variation-Aware Layer Assignment With Hierarchical Stochastic Optimization on a Multicore PlatformIEEE Transactions on Emerging Topics in Computing10.1109/TETC.2014.23165032:4(488-500)Online publication date: Dec-2014
  • (2013)Role of design in multiple patterningProceedings of the Conference on Design, Automation and Test in Europe10.5555/2485288.2485366(314-319)Online publication date: 18-Mar-2013
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  1. ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction

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    cover image ACM Conferences
    DAC '08: Proceedings of the 45th annual Design Automation Conference
    June 2008
    993 pages
    ISBN:9781605581156
    DOI:10.1145/1391469
    • General Chair:
    • Limor Fix
    Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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    Published: 08 June 2008

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    Author Tags

    1. OPC
    2. VLSI
    3. lithography
    4. manufacturability
    5. routing

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    Cited By

    View all
    • (2014)Design-for-debug routing for FIB probingProceedings of the conference on Design, Automation & Test in Europe10.5555/2616606.2617065(1-4)Online publication date: 24-Mar-2014
    • (2014)Variation-Aware Layer Assignment With Hierarchical Stochastic Optimization on a Multicore PlatformIEEE Transactions on Emerging Topics in Computing10.1109/TETC.2014.23165032:4(488-500)Online publication date: Dec-2014
    • (2013)Role of design in multiple patterningProceedings of the Conference on Design, Automation and Test in Europe10.5555/2485288.2485366(314-319)Online publication date: 18-Mar-2013
    • (2012)NCTU-GRIEEE Transactions on Very Large Scale Integration (VLSI) Systems10.1109/TVLSI.2010.210278020:3(459-472)Online publication date: 1-Mar-2012
    • (2012)DREIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2012.219247731:9(1379-1392)Online publication date: 1-Sep-2012
    • (2012)Robust and resilient designs from the bottom-up: Technology, CAD, circuit, and system issues17th Asia and South Pacific Design Automation Conference10.1109/ASPDAC.2012.6165064(7-16)Online publication date: Jan-2012
    • (2012)EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation17th Asia and South Pacific Design Automation Conference10.1109/ASPDAC.2012.6164956(263-270)Online publication date: Jan-2012
    • (2011)DOPPLERProceedings of the International Conference on Computer-Aided Design10.5555/2132325.2132398(283-289)Online publication date: 7-Nov-2011
    • (2011)High performance lithographic hotspot detection using hierarchically refined machine learningProceedings of the 16th Asia and South Pacific Design Automation Conference10.5555/1950815.1950963(775-780)Online publication date: 25-Jan-2011
    • (2011)DopplerProceedings of the 2011 IEEE/ACM International Conference on Computer-Aided Design10.1109/ICCAD.2011.6105343(283-289)Online publication date: 7-Nov-2011
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