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Design-process integration for performance-based OPC framework

Published: 08 June 2008 Publication History

Abstract

Along the continued shrinking of critical dimension (CD), the optical proximity correction (OPC) scheme inevitably becomes more aggressive and results in greater mask complexity and cost. Conventional OPC are edge-placement-error (EPE) driven without considering the effect of correction on circuit performance at all. We propose a performance-based OPC (PB-OPC) framework that employs a much simpler mask correction algorithm based on the real-time estimated device performances. When compared to the conventional OPC approach, our PB-OPC achieved 33 to 93% reduction in mask MEBES size and closer circuit performance matching to the design intent.

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Cited By

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  • (2016)Fast Lithographic Mask Optimization Considering Process VariationIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2015.251408235:8(1345-1357)Online publication date: 1-Aug-2016
  • (2014)Fast lithographic mask optimization considering process variationProceedings of the 2014 IEEE/ACM International Conference on Computer-Aided Design10.5555/2691365.2691413(230-237)Online publication date: 3-Nov-2014
  • (2014)Fast lithographic mask optimization considering process variation2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD)10.1109/ICCAD.2014.7001357(230-237)Online publication date: Nov-2014
  • Show More Cited By

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Published In

cover image ACM Conferences
DAC '08: Proceedings of the 45th annual Design Automation Conference
June 2008
993 pages
ISBN:9781605581156
DOI:10.1145/1391469
  • General Chair:
  • Limor Fix
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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Publication History

Published: 08 June 2008

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Author Tags

  1. OPC
  2. circuit performance
  3. design-process integration
  4. lithography
  5. mask design

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Overall Acceptance Rate 1,770 of 5,499 submissions, 32%

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Cited By

View all
  • (2016)Fast Lithographic Mask Optimization Considering Process VariationIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2015.251408235:8(1345-1357)Online publication date: 1-Aug-2016
  • (2014)Fast lithographic mask optimization considering process variationProceedings of the 2014 IEEE/ACM International Conference on Computer-Aided Design10.5555/2691365.2691413(230-237)Online publication date: 3-Nov-2014
  • (2014)Fast lithographic mask optimization considering process variation2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD)10.1109/ICCAD.2014.7001357(230-237)Online publication date: Nov-2014
  • (2013)Design for Manufacturing With Emerging NanolithographyIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2013.227675132:10(1453-1472)Online publication date: 1-Oct-2013
  • (2012)Design-Aware Mask InspectionIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2011.218190931:5(690-702)Online publication date: 1-May-2012
  • (2010)Performance-based optical proximity correction methodologyIEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems10.1109/TCAD.2009.203236029:1(51-64)Online publication date: 1-Jan-2010

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