Yang-Shan Tong
ABSTRACT
In this paper, an automatic lithography hotspot fix guidance generation method based on optical simulation engine and a fix flow utilizing this method are proposed. We find that subject to shape changes of original layout, there is strong correlation between the optical intensity maps of pre-OPC and post-OPC layouts. From this fact, we develop a fix action generation method by optimizing optical intensity in terms of polygon changes near a litho hotspot in a pre-OPC layout. Fix guidances as a subset of fix actions of a hotspot can be selected by a greedy method. The fix guidances are used as input to router to fix the hotspots. We integrate this fix guidance generation method with commercial lithography hotspot detection tool to create a post-route lithography hotspot fixing flow and test with industry 65nm designs. Compared with commercial flow, our method has 1.4X~1.9X fix rate with similar run time. The circuit timing impact is negligible in both our flow and industry flow. And our flow will not introduce any new design rule check (DRC) violation.
- M. Mark. DFM EDA Technology: A Lithographic Perspective, In Proc. IEEE Symposium on VLSI Technology, pages 90--91, 2007.Google Scholar
- F. M. Schellenberg. Resolution enhancement technology: the past, the present and extension for the future. In Proc. SPIE Microlithography Symposium, Santa Clara, CA, Feb. 2004.Google ScholarCross Ref
- Y.-R. Wu, M.-C. Tsai, and T.-C. Wang. Maze Routing with OPC Consideration. In Proc. ASP-DAC, pages 198--203, Shanghai, China, January 2005. Google ScholarDigital Library
- T.-C. Chen and Y.-W. Chang. Multilevel full-chip gridless routing with applications to optical-proximity correction. IEEE Trans.CAD, 26(6):1041--1053, June 2007. Google ScholarDigital Library
- J. Mitra, P. Yu and D.-Z. Pan. RADAR: RET-Aware Detailed Routing Using Fast Lithography Simulations. In Proc. DAC, pages 369--372, Anaheim, CA, June 2005. Google ScholarDigital Library
- M.-C. Tsai, D. Zhang and Z. Tang. Modeling Litho-Constrained Design Layout. In Proc. DAC, pages. 354--357, San Diego, CA, June 2007. Google ScholarDigital Library
- E. Roseboom, M. Rossman, F.-C. Chang and P. Hurat. Automated full-chip hotspot detection and removal flow for interconnect layers of cell-based designs. In Proc. SPIE, Vol. 6521, pp. 65210C, 2007.Google Scholar
- T. Kong, H. Leunga, V. Raghavan, A. K. Wong and S. Xu Model-assisted Routing for Improved Lithography Robustness. In Proc. SPIE, Vol. 6521, pp. 65210D, 2007.Google Scholar
- D. Zhang, S. Tong, A. Miloslavsky, Z. Tang. Router Driven Automated Correction of Lithography Hotspots. In SNUG Taiwan, 2007.Google Scholar
- PROLITH (version 9.0), KLA-Tencor Corporation.Google Scholar
- L. W. Liebmann. Layout impact of resolution enhancement techniques: impediment or opportunity? In Proc. ISPD, pages 110--117, 2003 Google ScholarDigital Library
- F. Schellenberg. A Little Light Magic. In IEEE Spectrum, pages 34--39. Sep. 2003. Google ScholarDigital Library
- P. Rai-Choudhury, Handbook of Microlithography, Micromachining and Microfabrication, Washington: SPIE Optical Engineering Press, 1997.Google Scholar
- M. Born and E. Wolf, Principles of Optics. New York: Pergamon, 1980.Google Scholar
- B. E. A. Saleh and M. Rabbani. Simulation of Partially Coherent Imagery in the Space and Frequency Domains and by Modal Expansions. In Appl. Opt. 21, pages 2770--2777, 1982.Google ScholarCross Ref
- Y.C. Pati, A.A. Ghazanfarian, and R.F. Pease. Exploiting Structure in Fast Aerial Image Computation for IC Patterns. IEEE Trans. Semi. Mfg., vol.10(1), pages 62--74, Feb 1997.Google ScholarCross Ref
- Calibre, Mentor Graphics Corporation.Google Scholar
- L.-D. Huang and D. F. Wong. Optical proximity correction (OPC)-friendly maze routing. In Proc. DAC, pages 186--191, San Diego, CA, June 2004. Google ScholarDigital Library
- H. Yao, S. Sinha, C. Chiang, X. Hong, and Y. Cai. Efficient process-hotspot detection using range pattern matching. In Proc. ICCAD, pages 625--632, San Jose, CA, Nov. 2006. Google ScholarDigital Library
- J. Xu, S. Sinha, and C. C. Chiang. Accurate Detection for Process-Hotspots with Vias and Incomplete Specification. In Proc. ICCAD, San Jose, CA, Nov. 2007. Google ScholarDigital Library
- T.-C. Chen, G.-W. Liao and Y.-W. Chang. Predictive Formulae for OPC with Applications to Lithography-Friendly Routing. In Proc. DAC, pages 510--515, Anaheim, CA, June 2008. Google ScholarDigital Library
- M. Cho, K. Yuan, Y. Ban and D. Z. Pan. ELIAD: Efficient lithography aware detailed router with compact post-OPC printability prediction. In Proc. DAC, pages 504--509, Anaheim, CA, June 2008. Google ScholarDigital Library
- PrimeYield LCC, Synopsys Inc.Google Scholar
Index Terms
- An automatic optical-simulation-based lithography hotspot fix flow for post-route optimization
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