2012 Proceeding- General Chair:
- Alan J. Hu
This is a special year for ICCAD; marking the 30th anniversary of the conference. Throughout these 30 years, ICCAD has been, and continues to be, the premier conference devoted entirely to technical innovation in design automation.
The core of ICCAD has always been the technical program of fully refereed research papers. As always, reviewing was double-blind, with strict conflict-of-interest policies to protect the integrity of the process. This year, we reinstated the physical Technical Program Committee meeting, as well as maintaining the full online review-and-deliberation system of the past several years. I believe that this has given us the best of both worlds: the in-depth consideration of an electronic TPC meeting with the face-to-face bandwidth, timeliness, and subtlety of a physical meeting. Out of 338 submissions worldwide, the Technical Program Committee selected a mere 82 papers, for a 24% acceptance rate.
Cited By
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Shaaban A, Shalaby A, Abu-Elyazeed M and Xu W (2024). On the application of inexact computation for low power SHA-256 Workshop on Electronics Communication Engineering (WECE 2023), 10.1117/12.3015633, 9781510672574, (11)
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Chae Y, Gupta P, Jonckheere R, Ronse K, Gargini P, Hendrickx E, Naulleau P and Itani T (2018). Defect avoidance for extreme ultraviolet mask defects using intentional pattern deformation International Conference on Extreme Ultraviolet Lithography 2018, 10.1117/12.2501525, 9781510622135, (52)
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Borisov V, Scheible J, Behringer U and Finders J (2018). Research on data augmentation for lithography hotspot detection using deep learning 34th European Mask and Lithography Conference, 10.1117/12.2326563, 9781510621213, (35)
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Yoshioka N, Qi Z, Rankin J, Narita E and Kagawa M (2016). Defect avoidance for EUV photomask readiness at the 7 nm node Photomask Japan 2016, 10.1117/12.2239421, , (99840Q), Online publication date: 10-May-2016.
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Sturtevant J, Capodieci L, Samboju N, Choi S, Arikati S and Cilingir E (2015). An efficient auto TPT stitch guidance generation for optimized standard cell design SPIE Advanced Lithography, 10.1117/12.2085834, , (94270A), Online publication date: 18-Mar-2015.
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Wood O, Panning E, Kagalwalla A and Gupta P (2014). Comprehensive defect avoidance framework for mitigating EUV mask defects SPIE Advanced Lithography, 10.1117/12.2046701, , (90480U), Online publication date: 17-Apr-2014.
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Joseph V and de Veciana G (2014). NOVA: QoE-driven optimization of DASH-based video delivery in networks IEEE INFOCOM 2014 - IEEE Conference on Computer Communications, 10.1109/INFOCOM.2014.6847927, 978-1-4799-3360-0, (82-90)
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Sturtevant J, Capodieci L, Yu B, Gao J, Xu X and Pan D (2014). Bridging the gap from mask to physical design for multiple patterning lithography SPIE Advanced Lithography, 10.1117/12.2048626, , (905308), Online publication date: 28-Mar-2014.
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Sturtevant J, Capodieci L, Gao J, Yu B and Pan D (2014). Accurate lithography hotspot detection based on PCA-SVM classifier with hierarchical data clustering SPIE Advanced Lithography, 10.1117/12.2045888, , (90530E), Online publication date: 28-Mar-2014.
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Hua S, Zhuo X and Panwar S (2013). A truthful auction based incentive framework for femtocell access 2013 IEEE Wireless Communications and Networking Conference (WCNC), 10.1109/WCNC.2013.6554914, 978-1-4673-5939-9, (2271-2276)
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Hu P and Ibnkahla M (2012). Consensus-based local control schemes for spectrum sharing in cognitive radio sensor networks 2012 26th Biennial Symposium on Communications (QBSC), 10.1109/QBSC.2012.6221363, 978-1-4673-1114-4, (115-118)
Index Terms
- Proceedings of the International Conference on Computer-Aided Design