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Layout optimization and template pattern verification for directed self-assembly (DSA)

Published: 07 June 2015 Publication History

Abstract

Recently, block copolymer directed self-assembly (DSA) has demonstrated great advantages in patterning contacts/vias for the 7 nm technology node and beyond. The high throughput and low process cost of DSA makes it the most promising candidate in patterning tight pitched dense patterns for the next generation lithography. Since DSA is very sensitive to the shapes and distributions of the guiding templates, it is necessary to develop new EDA algorithms and tools to address the patterning rules and constraints of the process. This paper presents a set of DSA-aware optimization techniques targeting the most urgent problems for DSA technology, including layout optimization and template pattern verification.

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  • (2023)Template Design for Complex Block Copolymer Patterns Using a Machine Learning MethodACS Applied Materials & Interfaces10.1021/acsami.3c0501815:25(31049-31056)Online publication date: 19-Jun-2023
  • (2018)Discrete relaxation method for contact layer decomposition of DSA with triple patterningIntegration10.1016/j.vlsi.2017.11.00461(77-87)Online publication date: Mar-2018

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  1. Layout optimization and template pattern verification for directed self-assembly (DSA)

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      cover image ACM Conferences
      DAC '15: Proceedings of the 52nd Annual Design Automation Conference
      June 2015
      1204 pages
      ISBN:9781450335201
      DOI:10.1145/2744769
      Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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      Published: 07 June 2015

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      Author Tags

      1. directed self-assembly
      2. layout optimization
      3. machine learning
      4. template verification

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      DAC '15: The 52nd Annual Design Automation Conference 2015
      June 7 - 11, 2015
      California, San Francisco

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      • (2023)Template Design for Complex Block Copolymer Patterns Using a Machine Learning MethodACS Applied Materials & Interfaces10.1021/acsami.3c0501815:25(31049-31056)Online publication date: 19-Jun-2023
      • (2018)Discrete relaxation method for contact layer decomposition of DSA with triple patterningIntegration10.1016/j.vlsi.2017.11.00461(77-87)Online publication date: Mar-2018

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