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Critical area computation for missing material defects in VLSI circuits
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Source International Symposium on Physical Design archive
Proceedings of the 2000 international symposium on Physical design table of contents
San Diego, California, United States
Pages: 140 - 146  
Year of Publication: 2000
ISBN:1-58113-191-7
Author
Evanthia Papadopoulou  IBM TJ Watson Research Center, Yorktown Heights, NY
Sponsor
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
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REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

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A.V. Ferris-Prabhu, "Defect size variations and their effect on the critical area of VLSI devices," IEEE J. of Solid State Circuits, SC-20,4, 878-880, Aug. 1985.
 
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D. T. Lee, "Medial Axis Transformation of a Planar Shape", IEEE Transactions on Pattern Analysis and Machine Intelligence', PAMI-4, 4, July 1982, 363-369.
 
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W. Maly, "Modeling of lithography related yield losses for CAD of VLSI circuits," IEEE Transactions on Computer-Aided Design, CAD-4,3, 166-177, July 1985.
 
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W. Maly, and J. Deszczka, "Yield Estimation Model for VLSI Artwork Evaluation," Electron Lett. vol. 19, no.6, 226-227, March 1983.
 
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C.H. Ouyang, W.A. Pleskacz, W. Maly, "Extraction of Critical Areas for Opens in Large VLSI Circuits", IEEE Trans. on Computer-Aided Design, vol. 18, no 2, 151-162, February 1999.
 
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B. R. Mandava, "Critical Area for Yield Models", IBM Technical Report TR22.2436, 12 Jan 1982.
 
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E. Papadopoulou and D.T. Lee, "Critical Area Computation via Voronoi Diagrams", IEEE Trans. on Computer-Aided Design, vol. 18, no.4, April 1999.
 
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J. Pineda de Gyvez, C. Di, "IC Defect Sensitivity for Footprint-Type Spot Defects," IEEE Trans. on Computer-Aided Design, 11, noS, 638-658, May 1992.
 
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C. H. Stapper and R. J. Rosner, "Integrated Circuit Yield Management and Yield Analysis: Development and Implementation," IEEE Trans. on Semiconductor ManufacturingVol. 8, No.2, 95-101, 1995
 
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C.H. Stapper, "Modeling of Defects in integrated circuits photolithographic patterns," IBM Y. Research and Development, vol.28, no.4, 461-475, 1984.
 
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I. A. Wagner and I. Koren, "An Interactive VLSI CAD Tool for Yield Estimation," IEEE Trans. on Semiconductor ManufacturingVol. 8, No.2, 130-138, 1995.
 
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H. Walker and S.W. Director, " VLASIC: A yield simulator for integrated circuits," IEEE Trans. on Computer-Aided Design, CAD-5,4, 541-556, 1986.
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