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- Yu XSong RZhang ZYang LZhang P(2023)Adjusting Photoresist Curing Temperature to Eliminate Electrostatic Breakdown from Etching ResiduesACS Applied Electronic Materials10.1021/acsaelm.2c01771Online publication date: 20-Apr-2023
- Simsek Caglar PRoto VVainio T(2022)User Experience Research in the Work Context: Maps, Gaps and AgendaProceedings of the ACM on Human-Computer Interaction10.1145/35129796:CSCW1(1-28)Online publication date: 7-Apr-2022
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